Business Details
40 Years
experience
Advanced CO2 Snow Cleaning Systems
Applied Surface Technologies has been a pioneer in carbon dioxide snow cleaning technology since 1986, offering advanced surface cleaning solutions for precision-critical industries. Our proprietary CO2 snow cleaning systems remove particles down to 3-5 nanometers while eliminating hydrocarbon contaminants without chemical waste. We serve semiconductor manufacturing, optical research, telescope maintenance, and art conservation sectors with equipment designed for both laboratory and field applications. Our team combines decades of technical expertise with continuous innovation, evidenced by peer-reviewed publications demonstrating our technology's superiority over ultrasonic and air-cleaning methods. We maintain rigorous quality standards through precision-engineered nozzles and customizable configurations that address diverse contamination challenges.Our commitment to environmental responsibility is demonstrated through our residue-free cleaning process that eliminates hazardous chemical disposal requirements. With international distribution networks and specialized equipment for vacuum systems, surface analysis, and MEMS device cleaning, we provide comprehensive solutions supported by technical documentation and application-specific training. Our engineering team collaborates with clients to optimize cleaning parameters including working distance, nozzle design, and CO2 purity specifications. We maintain active partnerships with research institutions and industry leaders to advance cleaning technology applications in nanotechnology and materials science. Our facility in New Providence, NJ houses R&D operations and equipment manufacturing, ensuring direct technical support for global clients.
Services
CO2 Snow Cleaning Equipment
Precision Surface Cleaning
Telescope Mirror Cleaning
Art Restoration Cleaning
Semiconductor Wafer Cleaning
Optical Component Cleaning
Vacuum System Decontamination
AFM Sample Preparation
Nanoprobe Cleaning
Fire Recovery Cleaning
Details
- Year established: 1986
Highlights and features
- Pioneering technology since 1986 with peer-reviewed efficacy
- Non-abrasive cleaning preserves sensitive surface materials
- Proven particle removal to 3-5 nanometer scale
- Environmentally responsible with zero chemical waste
- Specialized equipment for telescope mirrors and art conservation
Services
CO2 Snow Cleaning Equipment
Our engineered CO2 cleaning systems utilize phase-transformed carbon dioxide for non-contact surface decontamination. The technology employs controlled expansion of liquid or gaseous CO2 through precision nozzles to generate high-velocity cleaning streams. Systems include standard K1-10 units with dual nozzles, high-purity K4-10 models with electropolished components, and specialized telescope cleaning configurations. Equipment options feature solenoid automation, dual-gas moisture control, and portable liquid feed systems for field applications in semiconductor manufacturing and optical maintenance.
Precision Surface Cleaning
We provide contamination control solutions for critical manufacturing environments requiring particle removal down to 3-5 nanometer scale. Our cleaning protocols address silicon wafers, AFM calibration standards, and MEMS devices using adjustable working distances and nozzle geometries. The process effectively removes both particulate matter and organic residues from substrates including metals, ceramics, and polymers while maintaining surface integrity through controlled thermal exposure.
Telescope Mirror Maintenance
Our specialized low-velocity CO2 systems clean large astronomical mirrors up to 8 meters in diameter without physical contact. The process uses larger expansion zones to create gentle cleaning streams effective for particle removal on sensitive coatings. Equipment includes slot nozzles producing 5-10cm cleaning swaths and heated air options to prevent moisture condensation. Observatory clients benefit from portable configurations and discounted institutional pricing for ongoing maintenance programs.
Art Conservation Cleaning
We offer tailored cleaning solutions for cultural heritage preservation, removing contaminants from delicate surfaces including glass sculptures, polymer artifacts, and woven baskets. Our systems use controlled CO2 flow rates to eliminate particulates, hydrocarbons, and organic residues without affecting original materials. The non-abrasive process preserves patinas and protective coatings while specialized heating accessories mitigate moisture risks on thermally sensitive substrates during museum conservation projects.
Surface Analysis Preparation
Our technology enables preparation of surfaces for analytical testing including XPS, SIMS, and AFM analysis. The cleaning process removes nanoscale contaminants without altering substrate composition, critical for accurate surface science measurements. Systems include high-purity components to prevent recontamination and specialized chucks for securing samples during preparation. Research institutions use our equipment to achieve consistent cleaning results for semiconductor, optical, and nanomaterials research applications.
Questions
How does CO2 snow cleaning remove nanoscale particles?
Our technology uses phase-transformed CO2 particles that sublimate on impact, transferring momentum to dislodge contaminants while the high-velocity gas stream carries away debris.
Can this technology clean delicate optical surfaces?
Yes, our low-velocity nozzle systems safely clean telescope mirrors and precision optics without surface abrasion or thermal damage.
Is CO2 cleaning environmentally friendly?
Yes, our process eliminates chemical waste streams and uses reclaimed industrial CO2, with no residue requiring disposal.
What safety precautions are required?
Standard compressed gas handling protocols apply, including ventilation monitoring for CO2 levels and protective eyewear during operation.
How does this compare to ultrasonic cleaning?
Peer-reviewed studies show our method achieves 99.9%+ removal efficiency for submicron particles where ultrasonic methods plateau at 95% efficiency.
